跳到主要內容區
聯合大學材料工程學系 聯合大學材料工程學系

賴宜生副教授-詳細資料

個人資料

  • 姓名:賴宜生
  • 職稱:副教授
  • 專長:半導體元件、高分子記憶體、玻璃材料
  • 辦公室電話:037-382235
  • 電子信箱 :yslai@nuu.edu.tw
  • 傳真機:037-382247
  • 學歷:國立成功大學  材料科學及工程學系博士 (2003)

學歷

  • 國立成功大學 材料科學及工程學系 博士 (1999-2003)
  • 國立成功大學 材料科學及工程學系 碩士 (1997-1999)

經歷

  • 國立聯合大學材料系副教授 (2009 -)
  • 國立聯合大學材料系系主任 (2010 - 2013)
  • 國立聯合大學材料系助理教授 (2006 - 2009)
  • 成功大學 材料科學及工程學系博士後研究 (2003-2006)
  • 德州大學奧斯汀分校 電機與電腦工程學系訪問學者 (2004-2005)
  • 台灣積體電路公司 擴散與機械研磨部門工程師 (2002-2003)

開設課程

  • 物理冶金(一)、 物理冶金(二)、 半導體物理、 能源材料、 玻璃檢測技術、 電子顯微鏡學、 材料製程實驗

專長及研究領域

主要研究方向

  • 一、閘極電極材料的熱穩定性與功函數調配
  • 二、超薄玻璃的化學強化與特性分析
  • 三、銀色金屬釉的開發
  • 四、BZO透明導電膜的製作與特性分析
  • 五、高分子記憶體在可撓式基板的應用
  • 六、利用陽極氧化鋁模板製作Pt-Sn核殼結構
  • 七、利用快速退火法成長SiO奈米線

研究計畫

    計畫名稱 擔任工作 起迄年月 補助或委託機構 經費總額
    互溶型合金薄膜應用於閘極結構非晶覆蓋層之研究(104-2221-E-239-006-) 主持人 2015/08/01-2016/07/31 科技部 898,000
    陶笛用水溶性陶瓷射出成型粉末開發計畫(104-2745-8-239-001-) 主持人 2015/08/01-2016/07/31 科技部、天春窯 840,000
    BZO玻璃材料 主持人 2015/10/01-2016/03/31 工研院 100,000
    BZO透明玻璃材料 主持人 2015/11/01-2016/04/30 工研院 99,900
    委託鈉鈣玻璃分析 主持人 2015/10/01-2016/03/31 工研院 100,000
    材料分析及專利分析(延伸計畫) 主持人 2015/09/01-2015/10/31 誠研科技公司 200,000
    材料分析及專利分析 主持人 2015/05/01-2015/09/30 誠研科技公司 500,000
    玻璃先進技術諮詢與玻璃性質檢測及結構解析技術產業應用服務(3/3)(104-2622-E-239-001-) 共同主持人 2015/02/01-2016/01/31 科技部 2,474,000
    BZO透明導電玻璃之製作與研究 主持人 2014/09/01-2015/03/31 工研院 100,000
    開發一種新型低溫銀色金屬釉的陶笛 主持人 2014/09/01-2015/08/31 天春窯業工廠 350,000
    玻璃先進技術諮詢與玻璃性質檢測及結構解析技術產業應用服務(2/3)(103-2622-E-239-002-) 共同主持人 2014/02/01-2015/01/31 科技部 2,400,000
    玻璃先進技術諮詢與玻璃性質檢測及結構解析技術產業應用服務(1/3)(102-2622-E-239-003-) 共同主持人 2013/02/01-2014/01/31 科技部 2,400,000

重要著作

一、期刊論文

  • 1. Shin-Yu Lin and Yi-Sheng Lai*, (2015/8) “Structural and electrical properties of Nb/NbNx gates on HfO2 gate dielectrics,” Thin Solid Films 588, 61 (2015). (6 pages) (NSC 99-2221-E-239-001)
  • 2. Lian-Hong Wong and Yi-Sheng Lai*, (2015/5) “Characterization of boron-doped ZnO thin films prepared by magnetron sputtering with (100-x)ZnO-xB2O3 ceramic targets,” Thin Solid Films 583, 205 (2015). (7 pages) (NSC 97-2221-E-239-003)
  • 3. S. W. Yung, H. Y. Chiang, Y. S. Lai, F. B. Wu, Chuni Fu, Yi-Mu Lee*, (2015/1) “Thermal, optical and structural properties of Tb doped zinc aluminum phosphate glasses,” Ceram. Int. 41, 877 (2015). (12 pages)
  • 4. Shin-Yu Lin and Yi-Sheng Lai*, (2014/12) “Effect of nitrogen on the physical properties and work function of MoNx cap layers on HfO2 gate dielectrics,” ECS J. Solid State Sci. Technol. 3, N161 (2014). (5 pages) (NSC 99-2221-E-239-001)
  • 5. S. W. Yung, Y. S. Huang, Yi-Mu Lee*, and Y. S. Lai, (2013/9) “An NMR and Raman spectroscopy study of Li2O–SrO–Nb2O5–P2O5 glasses,” RSC Adv. 3, 21025 (2013). [SCI/EI, 2012 IF=2.562] (8 Pages)
  • 6. Chien Chon Chen, Chi Liang Chen, and Yi-Sheng Lai*, (2013/5) “The enhancement of platinum surface area by alumina template assistance in Sn/Pt core-shell nano/sub-micron sphere structure,” Ceram. Int. 39, 4369 (2013). [SCI/EI, 2012 IF=1.789] (7 pages) (NSC 99-2221-E-239-001 and NSC 99-2627-M-239-001)
  • 7. Chien Chon Chen, Chi Liang Chen, and Yi-Sheng Lai* (2011/12), “Template assisted fabrication of Pt-Sn core-shell nanosphere,” Mater. Chem. Phys. 131, 250 (2011). [SCI/EI, 2010 IF=2.353] (4 pages) (NSC 99-2627-M-239-001 and NSC 99-2221-E-239-001)
  • 8. S. M. Hsu, S. W. Yung*, C. C. Chang, K. L. Hsu, T. S. Chin, H. I. Hsiang, and Y.-S. Lai (2011/2), “Thermal, chemical, optical properties and structure of Er3+-doped and Er3+/Yb3+-codoped P2O5-Al2O3-ZnO glasses,” J. Non-Cryst. Solids 357, 1328 (2011) [SCI/EI, 2010 IF=1.483] (7 pages) (98-EC- 17A-08-S1-033)
  • 9. Yi-Sheng Lai*, S. W. Yung, Jyh-Liang Wang (2011/1), “Characterization of SiNx:H films deposited by rapid thermal chemical vapor deposition,” Thin Solid Films 519, 2235 (2011). [SCI/EI, 2010 IF=1.909] (6 pages) (NSC 97-2221-E-239-003)
  • 10. Chih-Huang Tsai, Yi-Sheng Lai, and J. S. Chen* (2009/11), “Thermal stability of hafnium and hafnium nitride gates on HfO2 gate dielectrics,” J. Alloy Compd. 487, 687 (2009). [SCI/EI, 2010 IF=2.134] (6 pages) (NSC 96–2628-E-006–012-MY3)
  • 11. S. W. Yung*, H. J. Lin, Y. Y. Lin, R. K. Brow, Y.-S. Lai, J. S. Horng, and T. Zhang (2009/9), “Concentration effect of Yb3+ on the thermal and optical properties of Er3+/Yb3+-codoped ZnF2-Al2O3-P2O5 glasses,” Mater. Chem. Phys. 117, 29 (2009). [SCI/EI, 2010 IF=2.353] (6 pages) (97-EC-17A-08-S1-033)
  • 12. Yi-Sheng Lai*, Jyh-Liang Wang, Sz-Chian Liou, and Chia-Hsun Tu (2009/2), “Size and density-control of silicon oxide nanowires by rapid thermal annealing and their growth mechanism,” Appl. Phys. A 94 357 (2009). [SCI/EI, 2010 IF=1.760] (7 pages) (NSC 96-2221-E-239-020)
  • 13. Jyh-Liang Wang, Yi-Sheng Lai*, Sz-Chian Liou, Chun-Chien Tsai, Bi-Shiou Chiou, and Huang-Chung Cheng (2008/4), “Ferroelectricity and negative temperature coefficient of resistance in pulsed-laser-deposited (Pb,Sr)TiO3 films,” J. Phys. D - Appl. Phys. 41, 085304 (2008). [SCI/EI, 2010 IF=2.105] (7 pages) (NSC 95-2221-E-009-253)
  • 14. Yi-Sheng Lai*, Jyh-Liang Wang, Sz-Chian Liou, and Chia-Hsun Tu (2008/2), “Tailoring of amorphous SiOx nanowires grown by rapid thermal annealing,” Chem. Phys. Lett. 453, 97 (2008). [SCI/EI, 2010 IF=2.280] (4 pages) (NSC 95-2218-E-239-001)
  • 15. Jyh-Liang Wang, Yi-Sheng Lai*, Sz-Chian Liou, Bi-Shiou Chiou, Chueh-Kuei Jan, and Huang-Chung Cheng (2008/1), “Structural and electrical investigation of laser annealed (Pb,Sr)TiO3 thin films,” J. Vac. Sci. Technol. B 26, 41 (2008). [SCI/EI, 2010 IF=1.268] (6 pages) (NSC 95-2221-E-009-253)
  • 16. Jyh-Liang Wang*, Yi-Sheng Lai, Bi-Shiou Chiou, Chen-Chia Chou, Trent Gwo-Yann Lee, Huai-Yuan Tseng, Chueh-Kuei Jan, and Huang-Chung Cheng (2008/1), “Temperature-dependent characteristics of pulsed-laser-deposited (Pb,Sr)TiO3 films at low temperatures,” Appl. Phys. A 90, 129 (2008). [SCI/EI, 2010 IF=1.760] (6 pages) (NSC 95-2221-E-009-252)
  • 17. Jyh-Liang Wang, Yi-Sheng Lai*, Der-Chi Shye, Chen-Chia Chou, Bi-Shiou Chiou, Chun-Ping Juan, and Huang-Chung Cheng (2007/10), “Dependence of ferroelectric characteristics on the deposition temperature of (Pb,Sr)TiO3 Films,” Jpn. J. Appl. Phys., Part 1 46, 6727 (2007). [SCI/EI, 2010 IF=1.018] (6 pages) (NSC 95-2221-E-009-252)
  • 18. Jyh-Liang Wang*, Yi-Sheng Lai, Bi-Shiou Chiou, Chen-Chia Chou, Chun-Chien Tsai, Trent Gwo-Yann Lee, and Huang-Chung Cheng (2007/10), “Crystallinity and electrical properties of (Pb,Sr)TiO3 films enhanced by laser assisted low-thermal-budget annealing,” Appl. Phys. A 89, 213 (2007). [SCI/EI, 2010 IF=1.760] (7 pages) (NSC 95-2221-E-009-253)
  • 19. Jyh-Liang Wang*, Yi-Sheng Lai, Bi-Shiou Chiou, Chueh-Kuei Jan, Chuan-Chou Hwang, and Huang-Chung Cheng (2007/8), “Effects of accumulated laser pulses on (Pb,Sr)TiO3 films post-excimer laser annealed at low temperatures,” J. Crystal Growth 306, 80 (2007). [SCI/EI, 2010 IF=1.737] (6 pages) (NSC 95-2221-E-009-252)
  • 20. Jyh-Liang Wang*, Yi-Sheng Lai, Sz-Chian Liou, Chen-Chia Chou, Huai-Yuan Tseng, Chun-Chien Tsai, Chueh-Kuei Jan, and Huang-Chung Cheng (2007/6), “Structural and electrical investigations of pulse-laser-deposited (Pb,Sr)TiO3 films at various oxygen partial pressures,” J. Electrochem. Soc. 154, G141 (2007). [SCI/EI, 2010 IF=2.420] (6 pages) (NSC 95-2221-E-009-253)
  • 21. Li-Min Chen, Yi-Sheng Lai, and J. S. Chen* (2007/2), “Influence of pre-deposition treatments on the interfacial and electrical characteristics of ZrO2 gate dielectrics,” Thin Solid Films 515, 3724 (2007). [SCI/EI, 2010 IF=1.909] (6 pages) (NSC 92-2623-7-006-015 and NSC 94-2623-7-006-020-AT)
  • 22. Jyh-Liang Wang*, Der-Chi Shye, Yi-Sheng Lai, Huai-Yuan Tseng, Chuan-Ping Juan, and Huang-Chung Cheng (2007/1), “Polarization degradation and breakdown of pulse-laser-deposited (Pb,Sr)TiO3 films at low temperatures,” Jpn. J. Appl. Phys., Part 1 46, 267 (2007). [SCI/EI, 2010 IF=1.018] (5 pages) (NSC 94-2218-E-009-028)
  • 23. Jyh-Liang Wang*, Yi-Sheng Lai, Trent Gwo-Yann Lee, Bi-Shiou Chiou, Chun-Chien Tsai, Huai-Yuan Tseng, Chueh-Kuei Jan, and Huang-Chung Cheng (2007/1), “Characteristics of low-temperature pulse-laser-deposited (Pb,Sr)TiO3 films in metal/ferroelectric/silicon structure,” J. Phys. D - Appl. Phys. 40, 254 (2007). [SCI/EI, 2010 IF=2.105] (6 pages) (NSC 95-2221-E-009-253)
  • 24. Chia-Hsun Tu*, Dim-Lee Kwong, and Yi-Sheng Lai (2006/12), “Negative differential resistance and electrical bistability in nanocrystal organic memory devices,” Appl. Phys. Lett. 89, 252107 (2006) [SCI/EI, 2010 IF=3.820] (3 pages) Also appears in Virtual Journal of Nanoscale Science and Technology, Vol. 15, Issue 1 (January, 2007).
  • 25. Jyh-Liang Wang*, Yi-Sheng Lai, Bi-Shiou Chiou, Huai-Yuan Tseng, Chun-Chien Tsai, Chuan-Ping Juan, Chueh-Kuei Jan, and Huang-Chung Cheng (2006/11), “Study on fatigue and breakdown properties of Pt/(Pb,Sr)TiO3/Pt capacitors,” J. Phys. Condens. Matter 18, 10457 (2006). [SCI/EI, 2010 IF=2.332] (11 pages) (NSC 94-2218-E-009-028)
  • 26. Pei-Chuen Jiang, Yi-Sheng Lai, and J. S. Chen* (2006/9), “Dependence of crystal structure and work function of WNx films on the nitrogen content,” Appl. Phys. Lett. 89, 122107 (2006) [SCI/EI, 2010 IF=3.820] (3 pages) (NSC 93-2216-E-006-015 and NSC 94-2216-E-006-033)
  • 27. Cheng-Hsueh Lu, Yi-Sheng Lai, and J. S. Chen* (2006/9), “Investigation of the Hf-based gate dielectrics deposited by reactive sputtering in oxygen or nitrogen atmosphere,” J. Electrochem. Soc. 153, F189 (2006). [SCI/EI, 2010 IF=2.420] (5 pages) (NSC 92-2623-7-006-015 and NSC 94-2623-7-006-020-AT)
  • 28. Chia-Hsun Tu*, Yi-Sheng Lai, and Dim-Lee Kwong (2006/8), “Electrical switching and transport in the Si/organic monolayer/Au and Si/organic bilayer/Al devices,” Appl. Phys. Lett. 89, 062105 (2006). [SCI/EI, 2010 IF=3.820] (3 pages)
  • 29. Yi-Sheng Lai*, Chia-Hsun Tu, Dim-Lee Kwong, and J. S. Chen (2006/6), “Charge transport characteristics in bistable resistive poly(N-vinylcarbazole) films,” IEEE Electron Device Lett. 27, 451 (2006). [SCI/EI, 2010 IF=2.714] (3 pages)
  • 30. Pei-Chuen Jiang, Yi-Sheng Lai, and J. S. Chen* (2006/6), “Influence of nitrogen content in WNx on its thermal stability and electrical property as a gate electrode,” J. Electrochem. Soc. 153, G572 (2006). [SCI/EI, 2010 IF=2.420] (6 pages) (NSC 92-2216-E-006-022 and NSC 93-2216-E-006-015)
  • 31. Chia-Hsun Tu*, Yi-Sheng Lai, and Dim-Lee Kwong (2006/5), “Memory effect in the current-voltage characteristic of 8-hydroquinoline aluminum salt films,” IEEE Electron Device Lett. 27, 354 (2006). [SCI/EI, 2010 IF=2.714] (3 pages)
  • 32. Yi-Sheng Lai*, J. S. Chen*, H. L. Sun, Z. B. Chen, C. T. Tien, S. Y. Yeh, C. W. Chen, F. S. Lee, Y. S. Ho, P. Y. Hsu, H. H. Wu, J. H. Wang, and C. M. Yang (2006/3), “Exploring the sheet resistance variation with various beam current densities in low energy ion implantation,” Nucl. Instrum. Methods Phys. Res. B 244, 338 (2006). [SCI/EI, 2010 IF=1.042] (5 pages) (NSC-93-2216-E-006-015)
  • 33. Li-Lan Yang, Yi-Sheng Lai, J. S. Chen*, P. H. Tsai, C. L. Chen, and C. Jason Chang (2005/11), “Compositional tailored sol-gel SiO2-TiO2 thin films – crystallization, chemical bonding configuration and optical properties,” J. Mater. Res. 20, 3141 (2005). [SCI/EI, 2010 IF=1.395] (9 pages) (NSC 92-2216-E-006-028)
  • 34. Yi-Sheng Lai*, Chia-Hsun Tu, Dim-Lee Kwong, and J. S. Chen (2005/9), “Bistable resistance switching of poly(N-vinylcarbazole) films for nonvolatile memory applications,” Appl. Phys. Lett. 87, 122101 (2005). [SCI/EI, SCI/EI, 2010 IF=3.820] (3 pages)
  • 35. Yi-Sheng Lai, C. H. Lu, Li-Min Chen, and J. S. Chen* (2005/9), “Comparison of thermal stability and chemical bonding configuration of plasma oxynitrided Hf and Zr thin films,” J. Electrochem. Soc. 152, F146 (2005). [SCI/EI, 2010 IF=2.420] (7 pages) (NSC 92-2623-7-006-015 and NSC 94-2623-7-006-020-AT)
  • 36. Jiin-Long Yang, Yi-Sheng Lai, and J. S. Chen* (2005/9), “Effect of heat treatment on the properties of non-stoichiometric p-type nickel oxide films deposited by reactive sputtering,” Thin Solid Films 488, 242 (2005). [SCI/EI, 2010 IF=1.909] (5 pages) (NSC 90-2216-E-006-069)
  • 37. Yi-Sheng Lai, J. S. Chen*, Y. S. Ho, H. L. Sun, C. J. Tsai, T. C. Chen, Y. F. Ko, F. S. Lee, and W. M. You (2005/7), “Energy dependence of radiation damage in Sb-implanted Si(100),” J. Electrochem. Soc. 152, G511 (2005). [SCI/EI, 2010 IF=2.420] (6 pages) (NSC 93–2216–E-006–015)
  • 38. Yi-Sheng Lai, J. S. Chen*, and J. L. Wang (2004/6), “Interlayer growth and electrical behavior of ultrathin-Ta2O5/SiOxNy/Si gate stacks,” J. Electrochem. Soc. 151, F135 (2004). [SCI/EI, 2010 IF=2.420] (6 pages) (NSC 92-2216-E-006-022)
  • 39. Yi-Sheng Lai and J. S. Chen* (2003/5), “Evolution of chemical bonding configuration in ultrathin SiOxNy layers grown by low-temperature plasma nitridation,” J. Vac. Sci. Technol. A 21, 772 (2003). [SCI/EI, 2010 IF=1.286] (7 pages) (NSC 91-2216-E-006-039)
  • 40. Yi-Sheng Lai and J. S. Chen* (2002/12), “Spectroscopic ellipsometry study on the structure of Ta2O5/SiOxNy/Si gate dielectric stacks,” Thin Solid Films 420-421, 117 (2002). [SCI/EI, 2010 IF=1.909] (5 pages) (NSC 89-2216-E-006-076)
  • 41. Yi-Sheng Lai, Kuan-Jen Chen, and J. S. Chen* (2002/7), “Effects of plasma pre-nitridation and post-deposition annealing on the structural and dielectric characteristics of Ta2O5/Si system,” J. Electrochem. Soc. 149, F63 (2002). [SCI/EI, 2010 IF=2.420] (6 pages) (NSC 89-2216-E-006-076)
  • 42. Yi-Sheng Lai, Kuan-Jen Chen, and J. S. Chen* (2002/5), “Investigation of the interlayer characteristics of Ta2O5 thin films deposited on bare, N2O and NH3 plasma nitridated Si substrates,” J. Appl. Phys. 91, 6428 (2002). [SCI/EI, 2010 IF=2.064] (7 pages) (NSC 89-2216-E-006-076)
  • 43. Yi-Sheng Lai and J. S. Chen* (2001/7), “Characterizations of tantalum pentoxide dielectric films grown by low pressure and plasma-enhanced chemical vapor deposition,” Jpn. J. Appl. Phys., Part 1 40, 4593 (2001). [SCI/EI, 2010 IF=1.018] (6 pages) (NSC 88-2216-E-006-032)
  • 44. J. H. Huang, Yi-Sheng Lai, and J. S. Chen* (2001/7), “Comparison of dielectric characteristics of Ta2O5 thin films on RuO2 and Ru bottom electrodes,” J. Electrochem. Soc. 148, F133 (2001). [SCI/EI, 2010 IF=2.420] (4 pages) (NSC 89-2216-E-006-076)

二、研討會發表

  • 1. Fan-Bean Wu*, Yi-Sheng Lai, Hsi-Wen Yang, ”Fabrication and characterization of heterogeneous silicate-phosphate Glass Fiber,” International Conference of Young Researchers on Advance Materials (ICYRAM 2012) (Biopolis, Singapore, July 1-6, 2012).
  • 2. Chien-Chon Chen, Chi-Liang Chen, and Yi-Sheng Lai*, “Surface morphology and catalyst activity of Sn-Pt nanoparticles coated on anodizing aluminum oxide,“ The 39th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), (San Diego, CA, April 23-27, 2012). (NSC 100-2221-E-239 -016)
  • 3. Jen-Chun Wang and Yi-Sheng Lai*, “Effect of stress on the electrical bistability of poly N-vinylcarbazole films,“ The 39th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), (San Diego, CA, April 23-27, 2012). (NSC 99-2221-E-239-001)
  • 4. Chi-Liang Chen, Chien-Chon Chen, and Yi-Sheng Lai*, “Alumina template assistance in Pt/Sn core-shell nano-sphere fabrication,“ The 38th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), (San Diego, CA, May 2-6, 2011). (NSC 99-2221-E-239-001)
  • 5. Shin-Yu Lin and Yi-Sheng Lai*, “Thermal annealing effect on material and electrical properties of NbNx gates on HfO2 gate dielectrics,” The 38th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), (San Diego, CA, May 2-6, 2011). (NSC 99-2221-E-239-001)
  • 6. Lian-Hong Wong, Yi-Sheng Lai*, D. S. Wuu, and Jyh-Liang Wang, “Influence of sputtering powers on the characteristics of ZnO:B thin films,” The 38th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), (San Diego, CA, May 2-6, 2011). (NSC 99-2221-E-239-001)
  • 7. You-Yuan Lin, Jyh-Liang Wang, and Yi-Sheng Lai*, “Electrical bistability of polystyrene thin films embedded with low-dimensional nanostructures,” The 217th Meeting of the Electrochemical Society, (Vancouver, Canada, April 25-30, 2010). (NSC 97-2221-E-239-003)
  • 8. Lian-Hong Wong, Yi-Sheng Lai*, and Chi-Shiung Hsi, “Study of boron-doped ZnO transparent conductive thin films,” The 217th Meeting of the Electrochemical Society, (Vancouver, Canada, April 25-30, 2010). (NSC 97-2221-E-239-003)
  • 9. Yi-Sheng Lai* and S. W. Yung, “Investigation of hydrogenated amorphous SiNx:H films grown by rapid thermal chemical vapor deposition,” The 215th Meeting of the Electrochemical Society, (San Francisco, CA, May 24-29, 2009). ECS Trans. 19(2), 467 (2009). (11 pages) (NSC 97-2221-E-239-003)
  • 10. Chiou-Mei Wang and Yi-Sheng Lai*, “Characterization of molybdenum nitride thin films deposited by reactive sputtering,” The 215th Meeting of the Electrochemical Society, (San Francisco, CA, May 24-29, 2009). (NSC 97-2221-E-239-003 and NSC97-2815-C-239-012-E)
  • 11. Yi-Sheng Lai*, Jyh-Liang Wang, and Sz-Chian Liou, “Analysis of silicon dioxde nanowires synthesized via rapid thermal annealing of Pt-coated Si substrates,” The 213th Meeting of the Electrochemical Society, (Phoenix, AZ, May 18-23, 2008). ECS Trans. 13(9), 1 (2008). (6 pages) (NSC 96-2221-E-239-020)
  • 12. C. H. Lu, Yi-Sheng Lai, and J. S. Chen*, “A simple approach to reduce interlayer formation of sputtered Hf-based gate dielectrics by nitrogen incorporation,” The 208th Meeting of the Electrochemical Society, (Los Angeles, CA, October 16-21, 2005). ECS Trans. 1(5), 425 (2006). (6 pages)
  • 13. C. C. Chang, Shiu-Ko JangJian, Yi-Sheng Lai, and J. S. Chen*, “Degradation of Cu/Ta-N/Ta/low-k structure via outgassing of Low-k dielectrics,” The 208th Meeting of the Electrochemical Society, (Los Angeles, CA, October 16-21, 2005). ECS Trans. 1(11), 105 (2006). (11 pages)
  • 14. C. M. Lin, Yi-Sheng Lai, and J. S. Chen*, “Photoluminescence behavior of Ti-doped Zn2SiO4 thin film phosphors,” The 208th Meeting of the Electrochemical Society, (Los Angeles, CA, October 16-21, 2005). ECS Trans. 1(34), 1 (2006). (6 pages)
  • 15. Yi-Sheng Lai, Li-Min Chen, C. H. Lu, and J. S. Chen*, “Structure properties and thermal stability of plasma oxynitrided Hf and Zr thin films,” American Vacuum Society (AVS) 51th International Symposium, (Anaheim, CA, November 14-19, 2004).
  • 16. Li-Min Chen, Yi-Sheng Lai and J. S. Chen*, “Fabrication and characterization of nanocrystalline ZrO2 gate oxide,” 2004 International Union of Materials Research Society – International Conference in Asia (IUMRS-ICA), (Hsinchu, Taiwan, November 16-18, 2004).
  • 17. Yi-Sheng Lai, J. S. Chen*, Y. S. Ho, H. L. Sun, and K. B. Huang, “Study on end-of-range defects induced by Sb implantation,” 2003 Materials Research Society (MRS) Fall Meetings, (Boston, MA, December 1-5, 2003), 792 (2003) R3.13. (6 pages)
  • 18. Yi-Sheng Lai and J. S. Chen*, “Effectiveness of plasma nitrided silicon oxynitride as a barrier layer between high k materials and Si substrates,” 2002 Materials Research Society (MRS) Fall Meetings, (Boston, MA, December 2-6, 2002), 745, 221 (2002). (6 pages)
  • 19. Yi-Sheng Lai and J. S. Chen*, “Spectroscopic ellipsometry study on the structure of Ta2O5/SiOxNy/Si gate dielectric stacks,” The 29th International Conference on Metallurgical Coatings and Thin Films (ICMCTF), (San Diego, CA, April 22-26, 2002).
  • 20. Yi-Sheng Lai, Kuan-Jen Chen, and J. S. Chen*, “Electrical properties of tantalum oxide films on plasma nitrided silicon substrates,” The 200th Meeting of the Electrochemical Society, (San Francisco, CA, September 2-7, 2001), PV 2001-24, pp. 22-30. (9 pages)
  • 21. J. S. Chen*, J. H. Huang and Yi-Sheng Lai, “Dielectric properties of Ta2O5 thin-film capacitors with Poly-Si, RuO2 and Ru bottom electrodes,” 2001 International Microelectronics and Packaging Society (IMAPS) - Taiwan Technical Symposium, (Hsinchu, Taiwan, April 27, 2001).
  • 22. Yi-Sheng Lai and J. S. Chen*, “Characterizations of PECVD deposited tantalum oxide thin films on Pt electrode,” Semiconductor Equipment and Materials International Conference (SEMICON Taiwan), 1999 IC Seminar, (Hsinchu, Taiwan, September 13-16, 1999).
  • 23. 蔡豪哲,賴宜生*,”鈉鈣玻璃與鋁矽酸鹽玻璃化學強化性質之比較”,中華民國陶業研究學會2015年會,(Taipei, Taiwan, May 22, 2015).
  • 24. 蔡豪哲,賴宜生*,”鈉鈣玻璃經離子交換強化性質研究”,中華民國陶業研究學會2015年會,(Taipei, Taiwan, May 22, 2015).
  • 25. 賴正偉,賴宜生*,蔡豪哲,”銀奈米粒子嵌入高分子薄膜之雙穩態特性研究”,2014台灣鍍膜科技協會年會(2014TACT),(Miaoli, Taiwan, Oct. 17-18, 2014).
  • 26. 鄧詠鐘,賴宜生*,”電漿功率對鉬鉭合金薄膜之特性研究”,2014台灣鍍膜科技協會年會(2014TACT),(Miaoli, Taiwan, Oct. 17-18, 2014).
  • 27. 賴正偉,賴宜生*,”奈米銀粒子濃度對PVK電阻式記憶體特性之影響”,2014中華民國高分子年會論文集,(Taichung, Taiwan, Jan. 10-11, 2014). (NSC 99-2221-E-239-001)
  • 28. 徐英耀,賴宜生*,陳建仲,” AAO templates assisted fabrication of solid-state capacitors”,中國材料科學學會102年年會論文集,(Taoyuan, Taiwan, Oct. 18-19, 2013). (NSC 99-2221-E-239-001)
  • 29. 王仁浚,賴正偉,賴宜生*,”應力對含銀奈米粒子之聚乙烯咔唑薄膜的電雙穩態之影響”,2013中華民國高分子年會論文集,(Chiayi, Taiwan, Jan. 25-26, 2013). (NSC 99-2221-E-239-001)
  • 30. 王仁浚,賴宜生*,”應力對聚乙烯咔唑薄膜的電雙穩態之影響”,中國材料科學學會101年年會論文集,(Yunlin, Taiwan, Nov. 23-24, 2012). (NSC 99-2221-E-239-001)
  • 31. 徐英耀,陳麒良,陳建仲,賴宜生*,”錫/鉑奈米核殼結構電極沉積在陽極氧化鋁模板之電化學特性”,中華民國陶業研究學會2012年會,(Miaoli, Taiwan, May 25, 2012). (NSC 100-2221-E-239-016)
  • 32. Shin-Yu Lin and Yi-Sheng Lai*, “Comparative study of niobium nitride and molybdenum nitride gates on hafnium oxide gate dielectrics,” 第六屆海峽兩岸工程材料研討會,(Nanjing, China, Nov. 8-9, 2011). (99-EC-17A-08-S1-033)
  • 33. 王仁浚,林信宇,陳麒良,賴宜生*,楊希文,”SiO2-Al2O3-Li2O-Na2O-MgO殼層玻璃添加La2O3應用於單模光纖之製作”,中華民國陶業研究學會2011 年會,(Taipei, Taiwan, May 28, 2011). (99-EC-17A-08-S1-033)
  • 34. Shin-Yu Lin and Yi-Sheng Lai*,”Investigation on characteristics of niobium nitride gates on hafnium oxide gate dielectrics,”第 18 屆奈米元件技術研討會(2011 Symposium on Nano Device Technology, SNDT 2011),(Hsinchu, Taiwan, Apr. 21-22, 2011). (NSC 99-2221-E-239- 001 and NDL99-C01-S034)
  • 35. 陳麒良,林信宇,賴宜生*,楊希文,”添加B2O3對SiO2-Al2O3-Li2O-Na2O-MgO玻璃作為光纖殼層性質之影響”,中國材料科學學會99年年會論文集,(Kaohsiung, Taiwan, Nov. 19-20, 2010). (98-EC-17A-08-S1-033)
  • 36. 林信宇,陳麒良,賴宜生*,陳邦旭,”氮流量調變之氮化鈮薄膜特性研究”,中國材料科學學會99年年會論文集,(Kaohsiung, Taiwan, Nov. 19-20, 2010). (NSC97-2221-E-239-003)
  • 37. 陳怡君,楊希文*,吳芳賓,賴宜生,朱錦明,龔吉和,”稀土元素於鋅鋁矽磷酸鹽玻璃之光學與結構研究”, 中華民國陶業研究學會2010 年會,(Taichung, Taiwan, May. 28, 2010). (97-EC-17A-08-S1-033)
  • 38. 賴宜生*,陳麒良,楊希文,”快速加熱化學氣相沉積氮化矽氫薄膜之特性研究”,中國材料科學學會98年年會論文集,(Hualien, Taiwan, Nov. 26-28, 2009). (NSC97-2221-E-239-003)
  • 39. 陳麒良,賴宜生*,”反應性磁控濺鍍氧化鉬薄膜之製備與性質探討”,中國材料科學學會98年年會論文集,(Hualien, Taiwan, Nov. 26-28, 2009). (NSC97-2221-E-239-003)
  • 40. 翁連宏,林佑遠,賴宜生*,楊希文,”矽酸鹽玻璃應用於光纖殼層之性質研究”,中國材料科學學會98年年會論文集,(Hualien, Taiwan, Nov. 26-28, 2009). (97-EC-17A-08-S1-033)
  • 41. 王秋眉,賴宜生*,”氮流量對氮化鉬薄膜材料的特性研究“,中國材料科學學會97年年會論文集,(Taipei, Taiwan, Nov. 21-22, 2008), P03-098. (NSC97-2815-C-239-012-E)
  • 42. 林佑遠,王志良,劉思謙,賴宜生*,”以快速熱退火法成長二氧化矽奈米線“,中國材料科學學會97年年會論文集,(Taipei, Taiwan, Nov. 21-22, 2008), P07-122. (NSC 96-2221-E-239-020)
  • 43. 蔡志煌,鄭崇銘,賴宜生,江佩錞,陳貞夙*,”氮化鉿薄膜閘極電極之特性研究“,中國材料科學學會95年年會論文集,(Tainan, Taiwan, Nov. 25-26, 2006), P03-001.
  • 44. 呂政學,賴宜生,蔡志煌,陳貞夙*,“氧化鉿及氮氧化鉿閘極介電層之製備與性質探討“,中國材料科學學會94年年會論文集,(Taipei, Taiwan, Nov. 25-26, 2005), P-91.
  • 45. 楊歷嵐,賴宜生,陳貞夙*,“摻鉺二氧化矽-二氧化鈦薄膜之光致發光特性表現“,中國材料科學學會94年年會論文集,(Taipei, Taiwan, Nov. 25-26, 2005), P-139.
  • 46. 呂政學,賴宜生,陳貞夙*,林義焜,“濺鍍HfO2閘極氧化膜之研製及其界面鑑定”,中國材料科學學會93年年會論文集,(Hsinchu, Taiwan, Nov. 17-18, 2004), PB1-15.
  • 47. 賴宜生,陳貞夙*,“電漿化學氣相沉積五氧化二鉭介電層之特性研究”,中國材料科學學會88年年會論文集, (Hsinchu, Taiwan, Nov. 26-27, 1999), p.137

三、中文期刊

  • 1. 賴宜生,吳芳賓,楊希文*,“以類棒管法抽製光纖之研究”,陶業季刊2014年1月,第33卷,第1期,1-6頁。
  • 2. 陳貞夙,賴宜生 “五氧化二鉭薄膜在閘極氧化層上的應用”,電子月刊2001年4月,第69期,118-128頁。
瀏覽數: